In a significant move to advance India’s space launch capabilities, the Indian Space Research Organisation (ISRO) Chairman S Somanath inaugurated advanced propellant tank production and computer numerical control (CNC) machining facilities at Hindustan Aeronautics Limited’s (HAL) Aerospace Division.
These state-of-the-art facilities are set to enhance the manufacturing capacity of critical components for the Launch Vehicle Mark–3 (LVM3), India’s heaviest and most powerful rocket.
Currently, ISRO’s production capabilities are limited to two LVM3 launches per year. With the new facilities, HAL will be able to manufacture enough critical components to support the production of six LVM3 rockets annually, meeting ISRO’s growing demands.
“HAL has enormous capacities, and this potential should be explored in the larger interest of both organisations. HAL will play a larger role in ISRO’s future missions and should focus on emerging technologies, designing challenges, and taking up end-to-end tasks to ease pressure on ISRO.” said Mr Somanath.
Echoing this sentiment, C B Ananthakrishnan, Chairman and Managing Director (Additional Charge) of HAL, expressed the organization’s commitment to accelerating human spaceflight missions and the development of next-generation launch vehicles.
He highlighted the immense opportunities for collaboration with ISRO and affirmed HAL’s dedication to investing further in unlocking the full potential of India’s space programs.
The propellant tank production facility will specialise in manufacturing high-performance fuel and oxidiser tanks, critical components for the LVM3 launch vehicle, which span 4 meters in diameter and up to 15 meters in length.
Additionally, the advanced CNC machining facility will handle high-precision fabrication of 4.5-metre class rings and propellant tank domes of LVM3.
This development marks a significant milestone in India’s space program, ensuring that HAL’s enhanced manufacturing capabilities will play a crucial role in supporting ISRO’s ambitious future missions.